HVS Automated
Free Space
Measurement System
HVS has designed
and developed a completely automated version of the Free
Space Measurement System for microwave and mm-wave
characterization and imaging of objects under test. The system
consists of nine computer-controlled servo-positioning
axes – four degrees of freedom (two linear, and two
rotary) for each Focused Antenna, and one linear
positioning capability for the sample holder. The system
is capable of scanning linearly over objects as large as
36” x 12”. The system can also scan over arbitrary shaped objects
from user-defined coordinates. The system is capable of
measuring the scattering parameters of the object under
test over the defined area. The electromagnetic properties
(complex permittivity and permeability, chirality, radar
absorption, etc.) can then be computed using the measured
S-parameters.
With the advent of
novel materials such as metamaterials and radar absorbing
coatings in the microwave and mm-wave frequencies, it is
very important to be able to characterize the
electromagnetic properties of such anisotropic materials. This is
important both for material evaluation and for creating new
materials by using the measurements in design and simulation
models. Examples of measurements include: Automated bistatic
(oblique incidence and reflection) measurement of RAM (Radar
Absorbing Material) over a range of incidence angles,
Automated oblique incidence and transmission measurements,
Measurements at various polarization configurations in order
to evaluate material behavior as a function of polarization,
etc. Also, the scanning ability of the system can be used
for microwave imaging applications. The HVS Automated Free
Space System can fully measure these electromagnetic
characteristics over a wide frequency range (5.85 to 110
GHz.)
Contact HVS with questions on how the HVS Automated Free
Space System can be used or customized for your
application. HVS will custom engineer the system to meet
your needs and supply the necessary software to meet your
application requirements.
